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The right system for growth of graphene mono layer and rapid thermal implant annealing of silicon carbide wafers
The AS-One is a versatile RTP system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes.
Rapid Thermal Processing / Annealing / Rapid Thermal Chemical Vapor Deposition ( RTP / RTA / RTCVD )
The cold wall chamber in association with the pulse annealing capability is a unique solution for annealing of thermally sensitive substrates.
The AS-Premium double side heating has been developed for annealing compound semiconductor wafers using silicon carbide coated susceptors.
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