Phone(+65) 6284 3818 | sales@premier-sols.com | Enquriy |
The AS-Premium double side heating has been developed for annealing compound semiconductor wafers using silicon carbide coated susceptors.
The AS-Premium reactor with the loadlock and turbo pumps provide oxygen free environment for silicon smoothening and other oxygen sensitive processes.
The Annealsys AS-Premium system can process samples up to 150 mm diameter or 156x156 mm² .
The reactor platform and the machine have been designed to accommodate a wide range of configurations to meet customers’ requirements in terms of process.
The chamber can receive a single side or a double side lamp heating furnace. The design of the process chamber allows manual loading and the connection to a cluster tool or a glove box (options).
Pyrometer and thermocouple temperature control are standard features. The fast digital PID temperature controller provides high temperature reproducibility.
Graphite and silicon carbide coated graphite susceptors are available for processing of samples with encapsulation.